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Boron (B) Sputtering Target 1.0" dia x 0.0125" 99.9% purity, US $130.00 – Picture 0
Boron (B) Sputtering Target 1.0" dia x 0.0125" 99.9% purity, US $130.00 – Picture 0

Boron (b) Sputtering Target 1.0" Dia X 0.0125" 99.9% Purity

US $130.00

  • Valley City, North Dakota, United States
  • Feb 16th
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Boron (B) Sputtering Target 1.0" dia x 0.0125" 99.9% purity                        .........Target production methods   ..,  include vacuum hot pressing  hot isostatic pressing  cold isostatic pressing  and cold press sintering

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