CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 0

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 1

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 2

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 3

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 4

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 5

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 6

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 7

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 8

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 9

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 10

CVD Equip. Corp. ET3000 LPCVD System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer, US $65,000.00 – Picture 11

Cvd Equip. Corp. Et3000 Lpcvd System: Silicon Reactor, 4 Gas Cabinets, Pyrolizer

US $65,000.00

Lancaster, Pennsylvania, United States
Mar 1st

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Complete Silicon Chemical Vapor Deposition (CVD) System Includes CVD Furnace, 4 SDC Gas Cabinets, Pyrolizer Made by CVD Equipment Co. (Rokonkama NY) This is a FirstNano model EasyTube 3000EXT LPCVD (Low Pressure Chemical Vapor Deposition) System System Includes ET 3000 Series CVD Furnace, Four (4) EasyGas Process Gas Cabinets, and Chemical Abatement Unit. All for one low price. This unit was manufactured by CVD Equipment Inc. Ronkonkoma NY USA and all components were purchased to operate together as one system. I Purchased this system new and ran it for one year only, performing silicon nanowire R & D. All use is fully documented. This is a High-Quality research and development grade tool configured for silicon nanowire growth. However, it could readily be used for other silicon epitaxial thin-film deposition. The system is in an environmentally controlled storage facility. It is in pristine, ready to go, condition and can be inspected prior to purchase. Comes with all necessary pumps, parts, lines, cables, manuals etc. for quick set up and operation. Easy to use computer interface. System includes four (4) Easy-Gas gas cabinets. Three are Model 1500 and one is Model 1000. All have individual control and nitrogen purge, There are up to Eight (8) individual process gas input lines in the system. Seven of the lines are currently configured for use with the following process gas sources: 1. Silane 2. Disilane 3. Diborane 4. Phosphine 5. HCl 6. Hydrogen 7. Nitrogen 8. Spare The system accommodates up to a 4” OD Quartz process tube and has three zone heating. The current configuration uses a rectangular process tube. The many advanced features in the Easytube 3000 include: Load Lock, Pyrolizer, Fully Automated Computer Control, Online system monitoring, Extra Quartz-ware, Spare Thermocouples, Manuas, Plus More. Everything shown in the pictures ++. Almost New, Many Extras, Motivated Seller. Comes with full documentation, manuals, receipts, data logs etc. Proprietary Recipes for Successful Operation Included With Purchase Please contact with any questions. Please Inquire with Joe at 646-725-7232 or riverjoe77@comcast.net for Questions or Further Details

“Complete System Ready For Use”