ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 0

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 1

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 2

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 3

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 4

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 5

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 6

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 7

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 8

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 9

ASM Pulsar 2000 ALCVD Polygon Atomic Layer CVD Reactor 200mm/8", US $74,999.99 – Picture 10

Asm Pulsar 2000 Alcvd Polygon Atomic Layer Cvd Reactor 200mm/8"

US $74,999.99

Phoenix, Arizona, United States
Jan 30th

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Click Here. Double your traffic. Get Vendio Gallery - Now FREE! ASM Pulsar 2000 Atomic Layer CVD Reactor - Can be Used on a Polygon Cluster Tool Comes with what you see in the pictures. If you don't see it, you probably wont get it. Specifications are from ASM and may vary slightly due to upgrades, options, or revisions this unit may or may not have. This unit was Intel surplus. It is being sold as-is. All we have is the reactor portion. The Unit's Serial Number Tag Reads: Model Number: Pulsar 2000 Serial Number: 00W5201 Power Requirements: 400 VAC, 3 Phase, 50/60 Hz, 22 A, 11 kW Date: 2000 CE Marked: Yes Description: THe Pulsar 2000 is the first ALCVD reactor for R&D and production IC applications. It is a module that can be connected to the Polygon cluster tool and is for single wafer thin film deposition on 200 mm wafers. ASM Microchemistry is the inventory and the world's leading innovator and supplier of Atomic Layer CVD modules and reactors. ALCVD technique is a surface-controlled, layer-by-layer process for the deposition of thin films with atomic layer accuracy. Each atomic layer formed in this sequential process is a result of saturated surface-controlled reactions. The surface-controlled growth mechanism of ALCVD provides excellent step coverage and dense films with no pinholes. The precision achieved with ALCVD allows processing of extremely thin films in a controlled way in the < 50 range. ALCVD reactors are versatile. Many different thin films can be produced using the same tool. For example nanolaminates and other mixed oxides can also be easily and quickly produced in the ALCVD reactor. Features: MESC-compatible single wafer ALCVD process module 150 - 300 mm (This unit is believed to be setup for 200 mm) wafer sizes 200 - 400°C deposition temperatures Up to 20 wph throughput Up to 200 /min growth rate Uniformities: < 1.2% within wafer and < 1.3% wafer to wafer Semiconductor Applications: High-k gate dielectrics for advanced CMOS (EOT approaching < 1 nm) Diffusion barriers for copper metallization Dielectric layers for memory capacitors and RF applications Passivation layers Dielectric and metal layers for integrated passives and MRAM Films for optical applications with different refractive indices Thin films for large-area flat panel display (FPD) applications Dielectric layers for GMR and TMR magnetic heads For More Pictures Please Click the Following: Picture 2 - Side View #1 Picture 3 - Side View #2 Picture 4 - Side View #3 Picture 5 - Inside - Process Chamber Picture 6 - Inside - Process Chamber, Lid Picture 7 - Top of Process Chamber Lid Picture 8 - Process Chamber Inlet Picture 9 - Process Chamber Viewing Window #1 Picture 10 - Process Chamber Viewing Window #2 Picture 11 - Gas Chamber? Picture 12 - Bottom Panel Removed #1 Picture 13 - Bottom Panel Removed #2 Picture 14 - Bottom Panel Removed #3 Picture 15 - Bottom Panel Removed #4 Picture 16 - Bottom Panel Removed #5 Picture 17 - Bottom Panel Removed #6 Picture 18 - Top Control Panel, Door Open Picture 19 - Power Control Panel, Door Open Picture 20 - Circuit Breaker Controls Picture 21 - Process Gas Tags Picture 22 - Serial Number Tag #1 Picture 23 - Serial Number Tag #2 $150.00 minimum for packaging, handling, and order processing. Shipping to be determined by destination. Prior to shipment I need to know the following information: (1) Are you the end-user of this item? (2) If you are not the ultimate end-user of the item, please state the ultimate end user's name. (3) What is the ultimate country destination? For all international customers, the following terms and conditions shall apply: These commodities, technology, or software are to be exported from the United States in accordance with Export Administration Regulations. Diversion contrary to U.S. law is prohibited. Domestic customers must also agree to the following terms and conditions: For items shipped within the United States, MHz Electronics, Inc's performance shall occur entirely within the United States. Unless expressly agreed to by MHz Electronics, this shall not be a routed party transaction. If you have any questions please call Michael at 1-866-MHZ-ELEC (1-866-649-3532) Toll Free. Also, please click here to view or other auctions! 05/15/10 Powered by eBay Turbo Lister The free listing tool. List your items fast and easy and manage your active items.

Condition	Used : An item that has been used previously. The item may have some signs of cosmetic wear, but is fully operational and functions as intended. This item may be a floor model or store return that has been used. See the seller’s listing for full details and description of any imperfections.
Seller Notes	“This unit was Intel surplus. It is being sold as-is. All we have is the reactor portion.”