Process materials ceo cerium oxide 3" sputtering target on cu backing plate,lab
Super conductive materials ,carbon 3" sputtering target bonded to copper back
Process materials tungsten w sputtering target, 3" diameter, purity 99.99%,lab
Williams advanced materials 3" diameter mo/sio2 12% sputtering target, lab item
Williams advanced materials inc.mo/sio2 20% at % sputtering target,lab equipment
Supper conductor materials inc.silicon dioxide sputtering target 3" sio2, lab
Honeywell 3" sputtering target gesbtese 230g, copper backing plate,lab equipment
Chrome (cr) sputtering target bonded on a stainless steel backing plate
3" diameter sputtering target labeled nb2o5 mounted on cu backing plate,lab item
Labeled ta2o5 sputtering target mounted on copper backing plate
Germanium evaporation material 3-6mm random pieces, qty ~ 200grams,lab equipment
Sputtering target cu, 1/4" oxygen free-copper plate, 3" diameter,lab equipment
Liberty max 8000 clean room & industrial ceiling fan
2406 ion systems controller. mod: tt1er4-1-ion2
Vwr 100 cert-clean room gloves large 40101-154 10 inch cleanroom class 100
Ion systems - 6430 - ionizing blower, input 24vac, power 6va
Lightly used hepa-pleat ii lab filtration unit, works great!
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