- San Jose, California, United States
- US $174,900.00
- Jan 30th
OXFORD PLASMALAB 300 RIE / PE ETCHER SYSTEM consisting of: - Model: 300 RIE / PE (Reactive Ion Etch/Physical Etch) - Up to 12"/300mm Wafer Capable - Setup to etch SiO2, Nitrides, or Polymers - Platen: 380mm diameter - Adixen ATH 400HPC Turbo Pump - HP Computer with Pentium Dual Core Processor - Advanced Energy RFG 1251 RF generator (13.56MHz) - Plasma mode: RIE/PE recipe controlled - Wafer stage temperature control: Neslab RTE-7 chiller - Gas Box: 6 gas Lines - Gas Box with
